Hitachi Metals, Ltd.

2005 News Release

December 6  

 

Sales of Newly Developed Industry-First,
All-In-One Mass Flow Controller Commenced

—Space Saver for Gas Supply Systems—
—Contributes to Boosting Semiconductor Manufacturing Equipment Operation Rates—

Tokyo, Japan, December 6, 2005—Hitachi Metals, Ltd. announced today that it has developed and commenced sales of its new all-in-one mass flow controller*1 (MFC), a precision gas mass flow controlling device that integrates pressure sensors and other peripherals. This all-in-one MFC (SFC1480G Series) makes it possible for users to change gas types and flow ranges as well as to test and control mass flow. The SFC1480G Series will not only allow for significant reductions in installation space for gas supply systems that are in high demand in the semiconductor industry, but also eliminate the time required for setting up a spare maintenance controller in place of the existing controller, reduce the time needed for gas discharge*2, and improve the operating rate of semiconductor manufacturing equipment.

1. Background of Development

In semiconductor manufacturing lines, gas supply systems perform thin film coating, etching*3 and other processes. Within gas supply systems, MFCs function as precision gas mass flow controllers, for which they are considered to be one of the most important system components. As larger-sized semiconductor wafers become more common, the size of semiconductor manufacturing equipment is also, consequently, becoming larger. On the contrary, demands for a more compact gas supply system are growing, and resulting in increased customer needs for even more compact system components for MFCs and other peripherals.
Furthermore, existing MFCs restrict users from changing gas types and flow ranges, as well as from testing and controlling mass flow while connected to the gas supply system. In order to complete such tasks, users must cease operation of the system and replace the MFC with spare maintenance controllers. The inefficiency of these maintenance processes has been the primary cause of the lowered operating rates of semiconductor manufacturing equipment.

2. Development Overview

Hitachi Metals has produced and marketed high-precision, high-performance MFCs for approximately 20 years. To address increasing customer requests for a more compact gas supply system with a higher performance output, Hitachi Metals has developed the new-concept, all-in-one MFC (SAM SFC1480G Series) based on its years of accumulated technology.

Mass Flow Controller

3. Special Features

This newly developed MFC is an all-in-one controller that has built-in peripherals such as a filter, pressure sensor, regulator*4 and shut-off valve*5. It also allows users to change gas types and flow ranges, and test and control mass flow without removing the controller from the gas supply system. The use of this all-in-one MFC will reduce the number of components used in the gas supply systems of semiconductor manufacturing lines, reducing installation space (footprint) by half the size of previous controllers. The SFC1480G Series will also contribute to raising the operating rate of semiconductor manufacturing equipment by saving time previously needed for replacement routines and gas discharge.

Special Feature Details

(1)	Cuts gas supply system installation space (footprint) in half
		Built-in PI control function (restricts the effect of primary-side pressure fluctuation) With the built-in function that lessens the effect of the upstream pressure fluctuation on the controlled mass flow, pressure sensors and regulators become unnecessary.
		Built-in filtering function
(2)	Raises operating rate of semiconductor manufacturing equipment
		Built-in gas shut-off function (patent pending) With the built-in, compact valve for completely shutting off MFC gas flow, dead volume (residual gas inside MFC) can be significantly reduced, shortening the time required for gas discharge.
		User-friendly function enabling users to change and control gas types, flow ranges Mass flow measurement data for the specific type of gas being used is stored internally, guaranteeing operating accuracy. Multi-gas, multi-range functions make it easier to change gas types and mass flow. Mass flow testing and control without removing MFC (patent pending) Reduction of backup component inventory (existing Hitachi Metals’ MFC: approx. 300 components, SAM SFC1480G Series: 10 components)

Gas Supply System Diagram

4. Sales Plan

Commence of shipment: Spring 2006
Fiscal 2008: ¥3.0 billion / year

5. Patent Applications

2 pending

6. Responsible Business Divisions

Manufacturing: Kuwana Works, Piping Components Company (Kuwana, Mie Prefecture)
Sales: Piping Components Company

7. Other

The MFC SFC1480G Series will be introduced and on display from Wednesday, December 7 through Friday, December 9 at the Japan Convention Center, Makuhari Messe (Chiba Prefecture), as part of SEMICON Japan 2005, the world's largest-class international exhibition for semiconductor manufacturing equipment and materials.

Customer Inquiries:
		Kenji Kimura and Makoto Kuroda Sales Division of Equipment and Precision Instruments Piping Components Company, Hitachi Metals, Ltd. Telephone: +81-3-5765-4296   Facsimile: +81-3-5765-8313
Press Inquiries:
		Akio Minami Corporate Communications Office, Hitachi Metals, Ltd. Telephone: +81-3-5765-4079   Facsimile: +81-3-5765-8312

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Reference: Explanation of Terms

*1 Mass flow controller A precision instrument equipped with a thermal mass flow sensor for use in piping systems. It automatically controls gas mass flow at a constant level regardless of changes in the temperature and pressure environment of a gas supply system. *2 Gas discharge A process in which gas is released through the discharge lines of semiconductor manufacturing equipment. The discharge lasts for several seconds as stabilization of the gas pressure inside the gas chamber takes effect. This process eliminates the negative effects of a sudden surge in gas flow that occurs when gas is introduced within the gas chamber of semiconductor manufacturing equipment. *3 Etching The process of creating circuit patterns, etc. on metal by melting the surface of a metal plate, leaving the necessary areas untouched. *4 Regulator A piping component that controls the pressure of gas supplied from the compressed gas cylinder at a constant level. *5 Shut-off valve A piping component bearing a valve structure used to interrupt or cease gas flow.

 

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