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2002 News Release
December 2 
December 2, 2002
Hitachi Metals Develops High-Performance Hybrid Mass Flow Controller™ for
Semiconductor Manufacturing Equipment;
Enables Control Up to 40 Times the Standard Level
Tokyo, Japan, December 2, 2002-Hitachi Metals, Ltd. announced today that it has developed a new Hybrid Mass Flow Controller™. Incorporating two types of sensors and an interconnected actuator, the new product, FANTAS™ *, enables the control not only of standard full-scale flow but also control from 10 to 40 times the standard level.
a new Hybrid Mass Flow Controller FANTAS
1. The Development Process
Hitachi Metals manufacturers and markets precision gas mass flow controlling devices (Mass Flow Controllers, metal diaphragm valves, and integrated units) for use in semiconductors and other thin membrane manufacturing. Mass Flow Controllers (MFCs) play a crucial role in semiconductor manufacturing by providing the final control of mass flow of the gasses that control membrane and etching volumes.Recent years have seen an increase in the need for the precise control of both large- and small- volume mass flow of gas with a single device as a means to achieve such objectives as thinner membrane semiconductors, increased microfabrication, Low-k (low permittivity), and reduced cost. In response, two years ago Hitachi Metals developed a dual-range MFC. With the ability to control mass flow up to approximately three times the full-scale mass, this device was used in such applications as new Φ 300mm devices, thus creating a new manufacturing process.
Today, the demand has mounted for large mass volume control of up to 20 times the full-scale mass with a single MFC. Hitachi Metals' development of FANTAS™ has enabled the fulfillment of such a requirement. Moreover, prototype FANTAS™ units are already in use at several major semiconductor manufacturing device makers, who have evaluated the new product very highly.
2. Special Features
Using a new construction based on the traditional hardware configuration with an installation space of only 106mm, FANTAS™ enables the mass flow control up to 40 times the standard full-scale mass.| 1) | By combining multiple differing sensing parameters, it also enables the measurement of mass flow with a substantially expanded scope of mass flow control. |
| 2) | An interconnected piezo-actuator acts as the control valve. By opening wide during high-volume mass flow, flow of up to 40 times the full-scale mass flow is made possible without any change to traditional levels of pressure loss. |
3. Patents
Five patents pending4. Sales Launch
January 20035. Sales Projections
Fiscal 2003: ¥300 millionFiscal 2005: ¥500 million
6. Manufacture and Sales
| Manufacturing: | Kuwana Create Co., Ltd.'s Sam Research Office (Kuwana Create is a wholly owned subsidiary of Hitachi Metals) |
| Sales: | Piping Components Company |
7. Other
Hitachi Metals will include FANTAS(tm) in its display at Semicon Japan 2002, held from December 4 to 6, 2002, at the Japan Convention Center-Makuhari Messe.Inquiries:
| Product: | Piping Components Company, Mr. Nogami Tel: +81-3-5765-4286 |
|
| Press: | Public Relations Office, Mr. Kobayashi Tel:+81-3-5765-4079 |
* FANTAS is the name of Hitachi Metals' series of high-performance digital mass flow devices and is a registered trademark of Hitachi Metals.
